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Micro‐Patterned Silicon Surfaces for Biomedical Devices
Author(s) -
Richter Karola,
Kubasch Christoph,
Bartha JohannWolfgang
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200731010
Subject(s) - silicon , etching (microfabrication) , materials science , deep reactive ion etching , black silicon , nanotechnology , nanometre , optoelectronics , isotropic etching , reactive ion etching , composite material , layer (electronics)
Abstract Actual trends in biotechnology require special chips, suitable for the immobilization of molecules. Thus, we created fields with randomly distributed silicon needles (so‐called “Black silicon”) as functional areas on silicon substrates by patterning of the surface without using an etch mask. Based on the DRIE by the so‐called “Bosch process” for anisotropic silicon etching we found out suitable parameter ranges for it. If passivating residues remain at the bottom of the etched patterns, they cause the growth of randomly distributed silicon needles during the anisotropic etching. We investigated their dimensions depending on the etching conditions. The realized silicon needles had a length of several micrometers and a diameter of several hundred nanometers. The surface area was enlarged up to a factor of 20.