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Surface Morphology of Magnetron Sputtered TiO 2 Films
Author(s) -
Šícha Jan,
Heřman David,
Musil Jindřích,
Strýhal Zdeněk,
Pavlík Jaroslav
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200730906
Subject(s) - anatase , rutile , materials science , sputter deposition , sputtering , morphology (biology) , surface roughness , cavity magnetron , thin film , surface finish , deposition (geology) , analytical chemistry (journal) , composite material , nanotechnology , chemical engineering , chemistry , photocatalysis , biochemistry , chromatography , biology , engineering , genetics , catalysis , paleontology , sediment
This article reports on investigation of the correlations between the process parameters, structure, and surface morphology of sputtered TiO 2 films prepared by magnetron sputtering. It has been found that the increase in the partial pressure of oxygen $p_{{\rm O}_{\rm 2} }$ results in (i) the decrease of TiO 2 film deposition rate and (ii) strong changes in its structure. The structure of ∼1 µm thick TiO 2 films gradually changes from rutile through mixture of rutile + anatase to anatase with increasing $p_{{\rm O}_{\rm 2} }$ at p T = 0.75 Pa. The same evolution of structure is observed when a TiO 2 film is sputtered at a constant value of $p_{{\rm O}_{\rm 2} }$ and the film thickness h increases. Increase in total working pressure leads to suppression of rutile structure. Maximum surface roughness was observed for films sputtered in the transition mode of sputtering.