Premium
Reactive Sputtering Deposition of a‐WO 3‐ z on Flexible PET/ITO Substrates for Electrochromic Devices
Author(s) -
Lin YungSen,
Chiang YueLiang
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200730408
Subject(s) - electrochromism , materials science , cyclic voltammetry , sputtering , indium tin oxide , electrochromic devices , amorphous solid , polyethylene terephthalate , thin film , transmittance , argon , analytical chemistry (journal) , tungsten , optoelectronics , electrode , nanotechnology , electrochemistry , chemistry , composite material , organic chemistry , metallurgy
The deposition of electrochromic thin films of a‐WO 3‐ z (amorphous tungsten oxide) on flexible PET (polyethylene terephthalate)/ITO (indium tin oxide) substrates by a reactive radio frequency (r.f.) sputtering method was investigated. The method used argon and oxygen at room temperature (23 °C). Cyclic voltammetry measurements showed that only low driving voltages −1 and +1 V were needed to provide reversible Li + ion insertion and extraction. Cyclic potentiostatic switching and visible–UV spectroscopy showed that thin films with oxygen deficiency z of 0.22 can offer excellent light modulation, with up to 62% transmittance variation and color efficiency of 61.3 cm 2 · C −1 .