Reactive Sputtering Deposition of a‐WO 3‐ z   on Flexible PET/ITO Substrates for Electrochromic Devices | Zendy

Lin YungSen | Zendy; Chiang YueLiang | Zendy

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Reactive Sputtering Deposition of a‐WO 3‐ z on Flexible PET/ITO Substrates for Electrochromic Devices

Author(s) -

Lin YungSen,

Chiang YueLiang

Publication year - 2007

Publication title -

plasma processes and polymers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.644

H-Index - 74

eISSN - 1612-8869

pISSN - 1612-8850

DOI - 10.1002/ppap.200730408

Subject(s) - electrochromism , materials science , cyclic voltammetry , sputtering , indium tin oxide , electrochromic devices , amorphous solid , polyethylene terephthalate , thin film , transmittance , argon , analytical chemistry (journal) , tungsten , optoelectronics , electrode , nanotechnology , electrochemistry , chemistry , composite material , organic chemistry , metallurgy

The deposition of electrochromic thin films of a‐WO 3‐ z (amorphous tungsten oxide) on flexible PET (polyethylene terephthalate)/ITO (indium tin oxide) substrates by a reactive radio frequency (r.f.) sputtering method was investigated. The method used argon and oxygen at room temperature (23 °C). Cyclic voltammetry measurements showed that only low driving voltages −1 and +1 V were needed to provide reversible Li + ion insertion and extraction. Cyclic potentiostatic switching and visible–UV spectroscopy showed that thin films with oxygen deficiency z of 0.22 can offer excellent light modulation, with up to 62% transmittance variation and color efficiency of 61.3 cm 2 · C −1 .

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