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Inert Gas Admixtures in PECVD of Titanium Dioxide Thin Films on Polymers—Influence on the UV Absorptance of the Films
Author(s) -
Sonnenfeld Axel,
Rudolf von Rohr Philipp
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200730404
Subject(s) - argon , absorptance , materials science , analytical chemistry (journal) , oxygen , titanium dioxide , inert gas , thin film , nitrogen , plasma enhanced chemical vapor deposition , titanium , absorption (acoustics) , chemistry , nanotechnology , optics , composite material , metallurgy , organic chemistry , physics , reflectivity
A low pressure radio frequency discharge (200 W for 5 min) was operated in oxygen, nitrogen/oxygen and argon/oxygen with small admixtures of titanium(IV)isopropoxide (TTIP). By means of the O 2 ‐flow, the O 2 ‐to‐TTIP ratio q was varied in all the gas mixtures. Besides the growth rate, the absorptance of films deposited was determined in the range of 200–500 nm. Accordingly, their cut‐off wavelength increased with q for mixtures containing N 2 or Ar, while it was unaffected for O 2 /TTIP mixtures. At 310 nm, the absorption coefficient was a 310 = 13 µm −1 for q ≈ 44 in Ar/O 2 /TTIP and marginally lower in N 2 /O 2 /TTIP as well as O 2 /TTIP. But, for decreasing q , a drastic decrease in a 310 ≈ 8 µm −1 was witnessed for O 2 /TTIP mixtures. In contrast, a 310 increased by 2 µm −1 for gas mixtures with Ar or N 2 .