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Optical and Structural Characteristics of Ion‐Plated Nb 2 O 5 and HfO 2 Films
Author(s) -
Hallbauer Antje,
Huber Daniel,
Klauser Frederik,
Kunz Andrea,
Tessadri Richard,
Kaiser Ute,
Yulin Sergiy,
Pulker Hans K.
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200730402
Subject(s) - materials science , amorphous solid , x ray reflectivity , thin film , analytical chemistry (journal) , ion plating , crystallite , dielectric , silicon , composite material , optoelectronics , metallurgy , nanotechnology , crystallography , chemistry , chromatography
Dielectric thin films (Nb 2 O 5 , HfO 2 ) were deposited on unheated silicon and glass substrates using reactive low voltage ion plating (RLVIP). Film refractive indices of n 550 = 2.39 for Nb 2 O 5 and n 550 = 2.13 for HfO 2 were determined between an arc current range of 40 and 60 A. Optical absorption coefficients in the low 10 −4 ‐range could be obtained for relatively high oxygen partial pressures. The film density was measured by XRR and yielded values higher than the bulk material. Topography and roughness investigations indicated nearly atomical flat film surfaces. XRD and TEM analyses of the film structure showed the presence of fine grained polycrystalline HfO 2 films while the deposited Nb 2 O 5 films remained amorphous.