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Surface Radical Detection on NH 3 ‐Plasma Treated Polymer Surfaces Using the Radical Scavenger NO
Author(s) -
Finke Birgit,
Schröder Karsten,
Ohl Andreas
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700134
Subject(s) - radical , scavenger , x ray photoelectron spectroscopy , chemistry , carbon fibers , polymer , ammonia , photochemistry , polystyrene , plasma , surface modification , organic chemistry , materials science , chemical engineering , composite number , physics , quantum mechanics , engineering , composite material
Polystyrene was treated by low‐pressure microwave‐excited ammonia plasmas to generate surface amino groups and subsequently treated with NO to label the remaining carbon radicals for in situ detection by XPS. Short time treatments between 5 ms and 40 s duration were used to vary densities of amino groups and radicals and thus to distinguish different reaction pathways. Apparently, after less than 30 ms treatment no tertiary carbon radicals exist. Also, there are indications that amino groups react with NO to carbon radicals which in turn react with NO. A more detailed study of surface radical generation at very low treatment times would be promising.