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Remote Plasma Deposited Silicon Dioxide‐Like Film Densification by Means of RF Substrate Biasing: Film Chemistry and Morphology
Author(s) -
Milella Antonella,
Creatore Mariadriana,
Blauw Michiel A.,
van de Sanden Mauritius C. M.
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700127
Subject(s) - biasing , substrate (aquarium) , materials science , plasma , silicon , silicon dioxide , morphology (biology) , optoelectronics , nanotechnology , engineering physics , composite material , electrical engineering , voltage , engineering , physics , oceanography , quantum mechanics , biology , genetics , geology
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