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Carbon Nanowalls Growth by Radiofrequency Plasma‐Beam‐Enhanced Chemical Vapor Deposition
Author(s) -
Vizireanu Sorin,
Nistor Leona,
Haupt Michael,
Katzenmaier Verena,
Oehr Christian,
Dinescu Gheorghe
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700120
Subject(s) - argon , acetylene , materials science , hydrogen , raman spectroscopy , carbon fibers , chemical vapor deposition , scanning electron microscope , analytical chemistry (journal) , transmission electron microscopy , plasma , substrate (aquarium) , chemical engineering , nanotechnology , chemistry , composite material , optics , physics , oceanography , organic chemistry , chromatography , quantum mechanics , geology , composite number , engineering
We report the remote growth of carbon nanowalls in a plasma beam sustained by an expanding argon radiofrequency discharge and injected with a small amount of acetylene in the presence of hydrogen as active gas. The growth process was investigated by varying the mass flow rates, ratio and nature of gases (argon, ammonia/hydrogen, and acetylene), the substrate temperature, and the radiofrequency power. Scanning and transmission electron microscopy, Raman spectroscopy, and electron diffraction methods were used for the investigation of the deposited material. We found that although materials with various morphologies can be generally obtained, nanostructured carbon material with a 2D morphology is obtained within a specific range of parameter values.