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Pulsed‐Plasma‐Induced Micropatterning with Alternating Hydrophilic and Hydrophobic Surface Chemistries
Author(s) -
Malkov Galiya S.,
Martin Ina T.,
Schwisow Whitney B.,
Chandler John P.,
Wickes Bronwyn T.,
Gamble Lara J.,
Castner David G.,
Fisher Ellen R.
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700118
Subject(s) - micropatterning , acrylic acid , x ray photoelectron spectroscopy , polystyrene , materials science , allylamine , contact angle , monomer , polymerization , methacrylate , chemical engineering , polymer chemistry , surface modification , analytical chemistry (journal) , chemistry , nanotechnology , organic chemistry , polyelectrolyte , polymer , composite material , engineering
High‐fidelity micrometer‐scale patterns of alternating hydrophobic and hydrophilic materials were created on polystyrene using pulsed plasma polymerization. The hydrophobic material was formed using C 3 F 8 . Grids with 80–100 µm holes were used to generate patterns with acrylic acid, 2‐hydroxyethyl methacrylate, N ‐vinyl‐2‐pyrrolidinone, N ‐vinylformamide, allylamine, and hexylamine. The materials were characterized with angle‐resolved XPS, spectroscopic ellipsometry, and static CA measurements. Excellent pattern fidelity with all monomers was confirmed with SEM, SAM, XPS imaging, and static ToF‐SIMS imaging.