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Nanostructured Carbonized Thin Films Produced by Plasma Immersion Ion Implantation of Block‐Copolymer Assemblies
Author(s) -
Kondyurin Alexey,
Bilek Marcela,
Janke Andreas,
Stamm Manfred,
Luchnikov Valeriy
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700111
Subject(s) - materials science , carbonization , copolymer , polystyrene , pyrolytic carbon , raman spectroscopy , thin film , chemical engineering , ion , nanolithography , ion implantation , fabrication , nanotechnology , composite material , scanning electron microscope , polymer , organic chemistry , optics , chemistry , physics , alternative medicine , pathology , pyrolysis , engineering , medicine
We present a new approach for the fabrication of highly ordered carbonized nanostructured thin films involving the ion beam treatment of self‐assembled block copolymers precursors. 70 nm‐thick porous polystyrene‐ block ‐poly(4‐vinyl pyridine) assemblies were treated by 20 keV nitrogen ions at fluences of 10 15 –10 16 ions · cm −2 . The resulting 35 nm‐thick films are almost completely carbonized, as confirmed by FTIR and micro‐Raman spectra, and retain hexagonal nanomorphology. The films are mechanically robust, stable at high temperatures and well suited for applications as ultrafiltration membranes, quantum dot or single molecule supports, masks for nanolithography. The carbonization of the films due to ion beam exposure occurred at temperatures much lower than required for pyrolytic carbonization.