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Influence of the Gas Humidity on the Uniformity of RF‐Powered Atmospheric‐Pressure Low‐Temperature DBD Plasmas
Author(s) -
Koo Il Gyo,
Cho Jin Hoon,
Lee Woong Moo
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700068
Subject(s) - atmospheric pressure , dielectric barrier discharge , plasma , water vapor , humidity , electron density , materials science , plasma cleaning , analytical chemistry (journal) , electron temperature , atmospheric pressure plasma , dielectric , atomic physics , chemistry , optoelectronics , meteorology , environmental chemistry , physics , organic chemistry , quantum mechanics
The effect of the water level in a He working gas on the uniformity of the atmospheric pressure plasmas was investigated using emission spectroscopy. The 13.56 MHz rf‐powered dielectric barrier discharges were generated using He gas, in which water vapor of various concentrations was added. Electron density of the discharge medium determined using the emission spectra clearly demonstrated that the humidity level affects the electron density and the uniformity of the plasma.

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