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Angle‐Resolved XPS Study of Plasma‐Deposited Polystyrene Films after Oxygen Plasma Treatment
Author(s) -
Haïdopoulos Marie,
Horgnies Matthieu,
Mirabella Frédéric,
Pireaux JeanJacques
Publication year - 2008
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700067
Subject(s) - contact angle , x ray photoelectron spectroscopy , polystyrene , surface modification , plasma cleaning , oxygen , plasma , materials science , etching (microfabrication) , radical , diffusion , plasma etching , wetting , analytical chemistry (journal) , chemical engineering , chemistry , polymer , nanotechnology , organic chemistry , layer (electronics) , composite material , physics , quantum mechanics , engineering , thermodynamics
Plasma oxidation of plasma deposited polystyrene (pPS) films was performed in an inductively coupled plasma reactor. Reconstruction of the oxygen concentration depth profiles based on angle‐resolved XPS data showed that two competitive mechanisms (functionalization and etching) happened during the oxygen plasma treatment. Static water contact angle measurements confirmed this result. Oxidized pPS films were also not stable with time; a loss of hydrophilicity was observed and reorganization of the topmost functionalized surface occurred involving diffusion of oxygen groups from the surface towards the bulk and re‐contamination by reaction of trapped radicals with hydrocarbon molecules present in ambient air.