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Diagnostics of SiO x ‐Containing Layers Deposited on Powder Particles by Dielectric Barrier Discharge
Author(s) -
Hähnel Marcel,
Brüser Volker,
Kersten Holger
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700015
Subject(s) - dielectric barrier discharge , analytical chemistry (journal) , x ray photoelectron spectroscopy , materials science , argon , dielectric , stoichiometry , layer (electronics) , oxygen , carbon fibers , silicon , hydrocarbon , atmospheric pressure , chemistry , chemical engineering , composite number , composite material , chromatography , organic chemistry , metallurgy , oceanography , optoelectronics , engineering , geology
We report on the analysis of the composition and internal structure of SiO x layers deposited on powder particles by using HMDSO as monomer, different oxygen admixtures in argon, and a dielectric barrier surface discharge under atmospheric pressure. Composition and structure of the deposited layers with special regard to silicon, carbon, and hydrocarbon bonding were studied by FTIR and XPS measurements and compared with previous investigations from the literature. For correlation of the layer composition and the plasma gas phase we used mass spectrometric analysis of the exhaust gas. The stoichiometric ratios of the deposited layers are remarkably influenced by the Ar/O 2 ratio and the discharge conditions.