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Adhesion Improvement of Plasma‐Polymerized Maleic Anhydride Films on Gold Using HMDSO/O 2 Adhesion Layers
Author(s) -
Chifen Anye N.,
Jenkins A. Toby A.,
Knoll Wolfgang,
Förch Renate
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200700012
Subject(s) - contact angle , hexamethyldisiloxane , materials science , x ray photoelectron spectroscopy , plasma polymerization , monolayer , adhesion , chemical engineering , silicon oxide , surface modification , substrate (aquarium) , polymer , maleic anhydride , layer (electronics) , polymer chemistry , polymerization , composite material , nanotechnology , plasma , silicon nitride , copolymer , physics , oceanography , quantum mechanics , geology , engineering
The use of SiO 2 ‐like layers as adhesion‐promoting inter‐layers between a reactive plasma polymer film and a gold substrate is compared to a self‐assembled monolayer of dodecanethiol and to bare gold. The chemical structure of the silicon oxide film is optimized by varying feed gas ratios and process input power. A 5 s oxygen plasma modification of the SiO 2 ‐like film deposited from hexamethyldisiloxane has been found to be vital to prepare the surface for covalent bonding of the subsequently deposited reactive polymer layer. Film chemical structures and reactivity have been studied using IR reflection‐absorption spectroscopy, XPS, contact angle goniometry and SPR spectroscopy.