Cover Picture: Plasma Process. Polym. 2/2006 | Zendy

Supiot Philippe | Zendy; Vivien Céline | Zendy; Granier Agnès | Zendy; Bousquet Angélique | Zendy; Mackova Anna | Zendy; Escaich David | Zendy; Clergereaux Richard | Zendy; Raynaud Patrice | Zendy; Stryhal Zdenek | Zendy; Pavlik Jaroslav | Zendy

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Cover Picture: Plasma Process. Polym. 2/2006

Author(s) -

Supiot Philippe,

Vivien Céline,

Granier Agnès,

Bousquet Angélique,

Mackova Anna,

Escaich David,

Clergereaux Richard,

Raynaud Patrice,

Stryhal Zdenek,

Pavlik Jaroslav

Publication year - 2006

Publication title -

plasma processes and polymers

Language(s) - English

Resource type - Reports

SCImago Journal Rank - 0.644

H-Index - 74

eISSN - 1612-8869

pISSN - 1612-8850

DOI - 10.1002/ppap.200690002

Subject(s) - cover (algebra) , materials science , scale (ratio) , composite material , physics , engineering , mechanical engineering , quantum mechanics

Cover: AFM scans (5µm × 5µm) of 500 nm thick films as deposited on Si from processes a) RFICP (full vertical scale: 12.6 nm), b) MIRA (full vertical scale: 44.9 nm), and c) DECRP (full vertical scale: 27.7 nm). Further details can be found in the Full Paper by P. Supiot, * C. Vivien, A. Granier, A. Bousquet, A. Mackova, D. Escaich, R. Clergereaux, P. Raynaud, Z. Stryhal, and J. Pavlik on page 100.

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