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Cover Picture: Plasma Process. Polym. 1/2006
Author(s) -
Poenariu Viorel,
Wertheimer Michael R.,
Bartnikas Raymond
Publication year - 2006
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200690000
Subject(s) - cover (algebra) , dielectric barrier discharge , materials science , atmospheric pressure , intensity (physics) , analytical chemistry (journal) , dielectric , plane (geometry) , plasma , microplasma , position (finance) , optics , chemistry , optoelectronics , physics , geometry , nuclear physics , mathematics , mechanical engineering , chromatography , meteorology , engineering , finance , economics
Cover: The picture on the cover shows axial, time‐dependent distributions of (a) total light emission intensity, and [(b) to (d)] those of spectral lines at (b) 380.5 nm (N 2 ), (c) 391.4 nm (N 2 + ), and (d) 706.5 nm (He I), during the positive voltage half‐cycle of an atmospheric‐pressure He discharge across a needle‐plane gap. Needle position at 3.0 mm, alumina dielectric plane at 0 mm. Further details can be found in the Full Paper by V. Poenariu, M. R. Wertheimer, * and R. Bartnikas on page 17.