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Plasma Deposition of Permanent Superhydrophilic a‐C:H:N Films on Textiles
Author(s) -
Hossain Mohammad Mokbul,
Hegemann Dirk,
Fortunato Giuseppino,
Herrmann Axel S.,
Heuberger Manfred
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600214
Subject(s) - superhydrophilicity , materials science , coating , surface modification , deposition (geology) , nanoporous , chemical engineering , etching (microfabrication) , plasma , amine gas treating , plasma etching , composite material , contact angle , nanotechnology , organic chemistry , chemistry , layer (electronics) , sediment , engineering , biology , physics , quantum mechanics , paleontology
A new approach to permanent hydrophilic modification of material surfaces is demonstrated using the deposition of nanoscaled functional coatings in RF plasmas at low temperatures under rivaling deposition/etching conditions. The incorporation of nitrogen and the generation of free radicals in a‐C:H films yields a strong hydrophilic modification when the deposited surface is exposed to atmosphere. Dyeing of nanoporous a‐C:H:N films demonstrated a high coating quality and the incorporation of accessible amine functionalities within the coating. This combination of polar groups with a suitable texturing ensures long‐term mechanical stability of the coating.