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Deposition of Organic Coatings at Atmospheric Pressure from Liquid Precursors
Author(s) -
Tatoulian Michael,
ArefiKhonsari Farzaneh,
Borra JeanPascal
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600187
Subject(s) - monomer , dielectric barrier discharge , deposition (geology) , polymer , atmospheric pressure plasma , atmospheric pressure , materials science , polyacrylic acid , plasma , chemical engineering , layer (electronics) , dielectric , nanotechnology , composite material , optoelectronics , meteorology , paleontology , physics , quantum mechanics , sediment , engineering , biology
This paper reports on the deposition of organic coatings on flat substrates using atmospheric pressure plasma systems. Special attention will be paid on the use of liquid monomer as the precursor, injected directly into the plasma region, or in post‐discharge. We will also present an original technology that combines a dielectric barrier discharge and an electrohydro dynamic atomisation (EHDA) system to deposit well‐defined polyacrylic acid films. The advantage of such system is the possibility to limit the extent of the monomer fragmentation and to give rise to rapid deposition of a highly functionalised plasma polymer layer.