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A Comparative X‐Ray and Neutron Reflectometry Study of Plasma Polymer Films Containing Reactive Amines
Author(s) -
Muir Benjamin W.,
Nelson Andrew,
Fairbrother Andrew,
Fong Celesta,
Hartley Patrick G.,
James Michael,
McLean Keith M.
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600175
Subject(s) - x ray reflectivity , x ray photoelectron spectroscopy , materials science , analytical chemistry (journal) , reflectometry , wafer , contact angle , neutron reflectometry , silicon , zeta potential , neutron , chemistry , thin film , chemical engineering , nanotechnology , composite material , nanoparticle , organic chemistry , optoelectronics , time domain , physics , neutron scattering , quantum mechanics , small angle neutron scattering , computer science , engineering , computer vision
Glow discharge AApp and HApp were prepared on silicon wafers and analyzed by XPS, AFM, Δ V ( ζ ‐measurements), XRR and NR. XRR and AFM measurements revealed smooth films of ≈30 nm thickness. XPS measurements in combination with XRR and NR allowed the film composition and mass densities (1.46 and 1.05 g · cm −3 for AApp and HApp respectively) to be calculated. The AApp film in contact with water was found to swell by ≈5%, contain ≈3% water and have ≈24% labile protons. The HApp film did not appear to swell, but contained ≈5% water, with ≈10% labile protons. The difference in the degree of proton exchange within the films and zeta potentials was attributed to the higher degree of residual amine functionality in the AA film.