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Electrical Breakdown of Argon and Trimethylsilane in Low‐Pressure DC Discharges: The Surface‐States Equilibration Principle
Author(s) -
Yasuda Hirotsugu
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600160
Subject(s) - glow discharge , atomic physics , trimethylsilane , ionization , argon , dissociation (chemistry) , electron , hydrogen , chemistry , kinetic energy , electron density , radical , materials science , plasma , ion , physics , organic chemistry , quantum mechanics , medicinal chemistry
The fundamental steps in creating glow discharges of Ar and TMS are completely different. While the glow discharge of Ar is the physical transformation of Ar atoms caused by ionization, the glow discharge of TMS is the chemical transformation of molecules that yields hydrogen atoms and variety of chemically reactive species, mostly free radicals (species with an un‐paired electron), caused by the low‐energy electron‐impact dissociation. The distribution of electron temperature and electron density in the broken‐down gas phase of Ar is re‐examined in light of the breakdown process, and the concept of the reference energy state of the luminous gas phase is presented.