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Surface Technology with Cold Microplasmas
Author(s) -
Klages ClausPeter,
Hinze Alena,
Lachmann Kristina,
Berger Claudia,
Borris Jochen,
Eichler Marko,
von Hausen Margret,
Zänker Antje,
Thomas Michael
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600116
Subject(s) - materials science , microplasma , microfluidics , plasma , atmospheric pressure plasma , coating , electrode , surface modification , plasma cleaning , dielectric , atmospheric pressure , dielectric barrier discharge , optoelectronics , substrate (aquarium) , nanotechnology , analytical chemistry (journal) , chemistry , physics , oceanography , chromatography , quantum mechanics , geology
Various new plasma‐based surface technological processes are made feasible by localizing atmospheric‐pressure discharges to predefined volumes with sub‐millimeter linear dimensions. So‐called Plasma Printing processes use cold discharges in microcavities formed temporarily by contacting a substrate with a suitably designed kind of plasma stamp. Aside from dielectric barrier discharges driven by mid‐frequency (MF) AC voltages, cold microplasmas can also be sustained in arrangements without a dielectric barrier, if RF excitation is used. The modification or coating of internal surfaces in already sealed microfluidic systems promises the achievement of a wide range of physico‐chemical surface properties which are difficult to attain by wet‐chemical or low‐pressure plasma processes. Using a proper electrode arrangement, the coating or modification can be localized to a selected segment of a microfluidic system.