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Mechanical Properties of Thin Films and Nanometric Multilayers Using Tensile Testing and Synchrotron X‐Ray Diffraction
Author(s) -
Le Bourhis Eric,
Faurie Damien,
Girault Baptiste,
Goudeau Philippe,
Renault PierreOlivier,
Villain Pascale,
Badawi Frédéric
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600094
Subject(s) - materials science , diffraction , synchrotron , texture (cosmology) , tungsten , ultimate tensile strength , composite material , isotropy , thin film , anisotropy , grain size , phase (matter) , crystallography , metallurgy , optics , nanotechnology , chemistry , physics , organic chemistry , artificial intelligence , computer science , image (mathematics)
X‐Ray diffraction (XRD) in combination with tensile testing is a very attractive tool for investigating the elastic behavior and further fracture or plasticity of metallic thin films and multilayers. Such studies are carried out with synchrotron X‐ray sources allowing for several diffraction and loading conditions to be investigated and hence for great precision to be achieved. XRD is phase selective and allows for the study of individual layers or phase contributions. The method is based on a length scale change to relate in‐grain elastic strains to tensile macro‐stresses. Hence, it requires the modeling of the grain interactions in view of the structure of the films (morphology, texture). The paper is illustrated with studies carried out on elastically isotropic tungsten (W) films, elastically anisotropic gold (Au) textured films, and nanometric tungsten/copper (W/Cu) multilayers.