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Deposition of “Polysiloxane” Thin Films Containing Silver Particles by an RF Asymmetrical Discharge
Author(s) -
Despax Bernard,
Raynaud Patrice
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600083
Subject(s) - hexamethyldisiloxane , plasma polymerization , sputtering , materials science , analytical chemistry (journal) , deposition (geology) , silver nanoparticle , polymerization , thin film , plasma , volume fraction , polymer , fourier transform infrared spectroscopy , volumetric flow rate , chemical engineering , nanoparticle , nanotechnology , chemistry , composite material , chromatography , paleontology , physics , quantum mechanics , sediment , engineering , biology
The aim of the present work is to produce silver‐containing SiC x O y H z thin films by using simultaneous sputtering of silver and plasma polymerization in an HMDSO plasma. The ratio of plasma polymerization to sputtering was adjusted by using a pulsed flow rate of the hexamethyldisiloxane precursor, which permitted an accurate control of the co‐deposition process. The presence of silver in the gas phase was detected by optical emission spectroscopy. The silver volume fraction was controlled over a wide range by superimposing physical sputtering onto the polymerization process taking place simultaneously within a very low and narrow range of HMDSO plasma pressure. The polymer matrix structures were analyzed by several techniques. FTIR spectra revealed the presence of SiOSi, SiCSi, SiCH 3 and CC groups whose amount varied with the silver content. TEM analysis showed Ag nanoparticles with sizes varying from 4 to 70 nm depending on the silver volume fraction.