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Plasma Polymerization Behavior of Fluorocarbon Monomers in Low‐Pressure AF and RF Discharges
Author(s) -
Gilliam Mary A.,
Yu Qingsong,
Yasuda Hirotsugu
Publication year - 2007
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600076
Subject(s) - fluorocarbon , monomer , polymer , plasma polymerization , polymerization , dissociation (chemistry) , hydrocarbon , butane , polymer chemistry , chemistry , plasma , materials science , analytical chemistry (journal) , organic chemistry , physics , quantum mechanics , catalysis
The plasma polymerization behavior of fluorocarbon monomers was investigated using C 3 F 6 , C 3 F 6 O, C 4 F 10 and C 2 F 4 H 2 , which were compared to hydrocarbons such as methane and butane. The plots of the normalized thickness growth rates of plasma polymers, GR/FM, versus the energy input composite parameters, W /FM, revealed the energy‐deficient and monomer‐deficient domains for each monomer, along with the critical energy input, ( W /FM) c , representing the transition between the two domains. The luminous gas phase in fluorocarbon discharges does not contain much polymer‐forming species and thus, the monomer‐deficient domain shifted to a much lower W /FM and GR/FM values than in the case of hydrocarbon systems. For hydrocarbon systems, deposition rates were greater in RF than in AF discharges, which is opposite to the situation observed for the fluorocarbon systems. These differences were attributed to the locations of the dissociation glows and to the nature of the luminous gas phase in respect to polymer‐forming species.