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Atmospheric Pressure Glow Discharge CVD of Al 2 O 3 Thin Films
Author(s) -
Hodgkinson John L.,
Sheel David W.,
Yates Heather M.,
Pemble Martyn E.
Publication year - 2006
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600042
Subject(s) - materials science , thin film , x ray photoelectron spectroscopy , atmospheric pressure , aluminium , substrate (aquarium) , deposition (geology) , glow discharge , atmospheric pressure plasma , analytical chemistry (journal) , scanning electron microscope , composite material , carbon film , plasma , chemical engineering , nanotechnology , chemistry , paleontology , oceanography , physics , chromatography , quantum mechanics , sediment , geology , engineering , biology
Summary: We report for the first time deposition of aluminium oxide thin films by APGD, plasma‐enhanced CVD. This approach allows deposition at substantially lower substrate temperatures than normally used in atmospheric pressure based processing. The films are analysed by SEM, XPS, RBS, XRD, and optical properties. It is demonstrated that the APGD approach yields films which are essentially smooth, conformal and free from pinholes or other imperfections.SEM image of alumina film on glass (film G).