Premium
Kinetic Modeling of the NF 3 Decomposition via Dielectric Barrier Discharges in N 2 /NF 3 Mixtures
Author(s) -
Chen Hsin Liang,
Lee How Ming,
Chang Moo Been
Publication year - 2006
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600037
Subject(s) - dielectric barrier discharge , decomposition , plasma , dielectric , thermal decomposition , materials science , nonthermal plasma , work (physics) , electron , kinetic energy , reaction mechanism , chemistry , thermodynamics , optoelectronics , physics , organic chemistry , nuclear physics , quantum mechanics , catalysis
Summary: Emission of PFCs (perfluorocompound) has attracted much attention in recent years due to its relatively high contribution to the global warming. Non‐thermal plasma is one of the most promising technologies to effectively control the PFC emissions. In this study, a cylindrical DBD (dielectric barrier discharge) reactor is adopted for the treatment of NF 3 ‐containing streams. Besides the experimental work, a numerical model is also developed for better understanding of the reaction mechanism of NF 3 abatement in N 2 /NF 3 mixtures. Good agreement is observed between the experimental data and the simulation results. Simulation results indicate that the electrons and the N atoms are the major active species responsible for the NF 3 decomposition. In addition, N 2 (A 3 Σ u + ) metastables plays a significant role in the NF 3 abatement. A simplified mechanism for the NF 3 decomposition in the N 2 – NF 3 plasmas is proposed as well.Reaction mechanisms for the decomposition of NF 3 in a N 2 – NF 3 plasma.