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Stability of Thin Plasma Polymer Films Applied on Coil Coatings
Author(s) -
Serra Ricardo,
Zheludkevich Mikhail L.,
Ferreira Mário G. S.
Publication year - 2006
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200600029
Subject(s) - polymer , materials science , polyurethane , plasma polymerization , thin film , surface modification , plasma , scanning electron microscope , chemical engineering , layer (electronics) , polymerization , analytical chemistry (journal) , composite material , polymer chemistry , chromatography , nanotechnology , chemistry , physics , quantum mechanics , engineering
Summary: The present work is devoted to the investigation of the stability of thin plasma polymer films of silica‐based material, which were deposited on top of polyurethane coil coatings. Microwave plasma polymerization was used with different precursor mixtures in order to produce thin polymer layers. The effects of precursor gas composition and of pressure were analyzed from the standpoint of the immersion stability of the plasma‐deposited polymer films. The results we obtained demonstrate a strong dependence of the immersion resistance on the gas precursor composition and pressure. Decrease of the operating pressure and of the oxygen concentration in precursor mixtures leads to the formation of more compact layers with a higher stability. Introduction of a fluorine‐containing component in the precursor mixtures also increases the stability of the plasma‐deposited polymer coatings.The SEM surface micrograph of a MW plasma polymer layer prepared using HMDSO/O 2 gas mixture at 0.05 mbar.