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Front Cover: Plasma Process. Polym. 5/2005
Author(s) -
Förch Renate,
Zhang Zhihong,
Knoll Wolfgang
Publication year - 2005
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200590008
Subject(s) - plasma , polymer , radical , materials science , polymerization , deposition (geology) , plasma polymerization , surface modification , chemical engineering , chemical physics , molecule , aqueous solution , polymer chemistry , chemistry , composite material , organic chemistry , paleontology , quantum mechanics , sediment , biology , physics , engineering
Front Cover: During the plasma‐on phase of pulsed plasma deposition reactions, the surface is subjected to a highly reactive mixture of species and UV‐irradiation leading to a combination of surface modification, deposition and ablation processes. When the plasma is turned off, the ions, metastables and electrons disappear due to relaxation processes, leaving behind only long lived radicals, which can undergo radical polymerisation reactions. Careful adjustment of the plasma process conditions allows for a significant control over the chemical structure and cross link density of the deposits. When swollen in aqueous solution, low cross linked functionalized plasma polymer films behave as 3‐dimensional surfaces and enable the binding of molecules within the polymer network. Further details can be found in the Feature Article by R. Förch, * Z. Zhang, and W. Knoll on page 351.