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PIC – MCC Numerical Simulation of a DC Planar Magnetron
Author(s) -
Kolev Ivan,
Bogaerts Annemie
Publication year - 2006
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200500118
Subject(s) - cathode , cavity magnetron , argon , diffusion , monte carlo method , voltage , sputter deposition , materials science , atomic physics , planar , line (geometry) , computational physics , direct current , physics , electrical engineering , sputtering , engineering , thermodynamics , thin film , nanotechnology , computer science , geometry , mathematics , statistics , computer graphics (images)
Summary: A 2d3v numerical model of a DC sputter magnetron is presented. The model is fully self‐consistent and kinetic. Based on the Particle‐in‐Cell/Monte Carlo Collisions technique it includes modules for the gas heating and the diffusion transport of the sputtered atoms. An external electric circuit is incorporated to achieve the calculation of the cathode voltage in a self‐consistent manner, as well as the simulation of the constant current regime. The model is applied to a laboratory magnetron operated in argon.Calculated distribution of the electric potential, V , at p = 10 mTorr. The white line corresponds to V = 0 V.