Premium
Surface Analysis of Plasma‐Deposited Polymer Films, 4
Author(s) -
Swaraj Sufal,
Oran Umut,
Lippitz Andreas,
Schulze RolfDieter,
Friedrich Joerg F.,
Unger Wolfgang E. S.
Publication year - 2005
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200400070
Subject(s) - x ray photoelectron spectroscopy , radical , branching (polymer chemistry) , plasma , monomer , polymer , materials science , analytical chemistry (journal) , polymerization , oxygen , ethylene , chemistry , chemical engineering , organic chemistry , composite material , physics , catalysis , quantum mechanics , engineering
Summary: XPS and NEXAFS spectroscopy were used for the chemical characterization of pulsed plasma‐deposited ethylene films before and after exposure to ambient air. The influence of external plasma parameters on the spectroscopic results was investigated. Information on the chemical character of the plasma‐polymerized films, such as the regularity of the primary structure, the amount of long‐living radicals, and branching or cross‐linking or both was derived from this data. “Irregularity” and radical concentration for post‐plasma reactions of the plasma‐deposited films increased with the duty cycle or power. A decreased level of monomer fragmentation and, consequently, an increase in regularity is partially concluded from the experimental data when the monomer pressure is increased. The concentration of surface radicals available for post‐plasma reactions also increased with monomer pressure. The correlation found between the degree of the post‐plasma oxygen incorporation and the variation of the various external parameters agreed with earlier ToF‐SSIMS findings.