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Surface Analysis of Plasma‐Deposited Polymer Films, 2
Author(s) -
Swaraj Sufal,
Oran Umut,
Lippitz Andreas,
Schulze RolfDieter,
Friedrich Jörg F.,
Unger Wolfgang E. S.
Publication year - 2004
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.200400022
Subject(s) - polystyrene , x ray photoelectron spectroscopy , xanes , styrene , polymerization , materials science , plasma polymerization , polymer , analytical chemistry (journal) , monomer , polymer chemistry , chemistry , copolymer , spectroscopy , chemical engineering , organic chemistry , composite material , physics , quantum mechanics , engineering
Abstract Summary: Chemical properties of plasma‐polymerized styrene films can be effectively controlled by the appropriate choice of external plasma parameters, such as duty cycle, power and monomer pressure. Chemical properties here are the regularity of the primary structure, the amount of long living radicals and branching or cross‐linking or both in plasma polymerized styrene films, which can be indirectly monitored by X‐ray photoelectron spectroscopy (XPS) and near edge X‐ray absorption fine structure (NEXAFS) spectroscopy. Principally, XPS and NEXAFS spectra of plasma‐polymerized styrene show all the spectroscopic fingerprints characteristic of atactic polystyrene indicating an inherent similarity of the respective primary chemical structures. There is an increase in irregularity and radical concentration for the plasma deposited films with increasing duty cycle or power. With an increase in monomer pressure, a decreased level of monomer fragmentation and, consequently, an increase in regularity must be concluded from the experimental data. The applied power regulates the fragmentation of the monomers as monitored by spectroscopic signals correlated to the aromatic rings. A trend in the extent of the post‐plasma oxygen incorporation according to the variation of the various external plasma parameters was deduced, which agrees with earlier ToF‐SIMS findings ( Plasma Process. Polym. , 2004 , 1 , 123).Total electron yield NEXAFS spectra of atactic polystyrene reference film (a) and a selected pulsed plasma‐polymerized styrene film (b).