Continuous and Modulated Deposition of Fluorocarbon Films from c‐C 4 F 8  Plasmas | Zendy

Milella Antonella | Zendy; Palumbo Fabio | Zendy; Favia Pietro | Zendy; Cicala Grazia | Zendy; d'Agostino Riccardo | Zendy

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Continuous and Modulated Deposition of Fluorocarbon Films from c‐C 4 F 8 Plasmas

Author(s) -

Milella Antonella,

Palumbo Fabio,

Favia Pietro,

Cicala Grazia,

d'Agostino Riccardo

Publication year - 2004

Publication title -

plasma processes and polymers

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.644

H-Index - 74

eISSN - 1612-8869

pISSN - 1612-8850

DOI - 10.1002/ppap.200400021

Subject(s) - fluorocarbon , duty cycle , plasma , deposition (geology) , analytical chemistry (journal) , thin film , torr , phase (matter) , gas phase , materials science , work function , chemistry , nanotechnology , chromatography , physics , composite material , thermodynamics , organic chemistry , paleontology , power (physics) , quantum mechanics , sediment , layer (electronics) , biology

Summary: Continuous and modulated c‐C 4 F 8 (perfluorocyclobutane) plasmas were used to deposit thin Teflon‐like films. Gas phase and film composition and structure were investigated and the results can be rationalized with the deposition mechanism developed in a previous work for C 2 F 4 ‐modulated plasmas. The effect of modulation on the morphology and the chemistry of the surface were studied.CF x percentages as a function of the duty cycle for films deposited for 90 min from modulated discharges sustained at 100 W, 300 mtorr, and 6 sccm.

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