In‐plane and out‐of‐plane defectivity in thin films of lamellar block copolymers

We investigate the ordering of poly(styrene‐ b ‐methyl methacrylate) (PS‐PMMA) lamellar copolymers (periodicity L 0  = 46 nm) confined between a free surface and brushed poly(styrene‐ r ‐methyl methacrylate) silicon substrate. The processing temperature was selected to eliminate wetting layers at the top and bottom interfaces, producing approximately neutral boundaries that stabilize perpendicular domain orientations. The PS‐PMMA film thickness ( t  = 0.5 L 0  − 2.5 L 0 ) and brush grafting density (Σ = 0.2–0.6 nm −2 ) were systematically varied to examine their impacts on in‐plane and out‐of‐plane ordering. Samples were characterized with a combination of high‐resolution microscopy, X‐ray reflectivity, and grazing‐incidence small‐angle X‐ray scattering. In‐plane order at the top of the film (quantified through calculation of orientational correlation lengths) improved with t n , where the exponent n increased from 0.75 to 1 as Σ decreased from 0.6 to 0.2 nm −2 . Out‐of‐plane defects such as tilted domains were detected in all films, and the distribution of domain tilt angles was nearly independent of t and Σ. These studies demonstrate that defectivity in perpendicular lamellar phases is three‐dimensional, comprised of in‐plane topological defects and out‐of‐plane domain tilt, with little or no correlation between these two types of disorder. Strong interactions between the block copolymer and underlying substrate may trap both kinds of thermally generated defects. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 339–352