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Cover Image, Volume 58, Issue 8
Publication year - 2020
Publication title -
journal of polymer science
Language(s) - English
Resource type - Reports
eISSN - 2642-4169
pISSN - 2642-4150
DOI - 10.1002/pol.20200224
Subject(s) - cover (algebra) , polymer , volume (thermodynamics) , styrene , computer science , citation , image (mathematics) , decomposition , polymer science , chemistry , world wide web , physics , copolymer , artificial intelligence , organic chemistry , engineering , mechanical engineering , quantum mechanics
A novel non‐chemically amplified resist utilizing the interaction between hexafluoroisopropyl alcohol‐containing styrene and photochemical acid generators (PAGs) is reported by Takashi Doi and colleagues in their article on page 1062. The cover image shows the polymer, which is hardly soluble in the alkaline developers due to the interaction with PAGs, becomes easily soluble as a result of their decomposition under light irradiation. This platform can be applied to a wide range of exposure wavelengths by changing the polymer backbones and/or structures of PAGs. (DOI: 10.1002/pol.20190280 )