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Kinetic modelling of the low‐temperature photo‐oxidation of hexafluoropropene
Author(s) -
Faucitano A.,
Buttafava A.,
Comincioli V.,
Marchionni G.,
Pasquale R. J. De
Publication year - 1991
Publication title -
journal of physical organic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.325
H-Index - 66
eISSN - 1099-1395
pISSN - 0894-3230
DOI - 10.1002/poc.610040506
Subject(s) - chemistry , radical , substituent , reactivity (psychology) , alkoxy group , photochemistry , fluorine , reaction rate constant , bond cleavage , double bond , kinetic energy , reaction mechanism , kinetics , computational chemistry , organic chemistry , alkyl , catalysis , medicine , alternative medicine , physics , pathology , quantum mechanics
By kinetic simulation, the significant features of the mechanism of the low‐temperature photo‐oxidation of hexafluoropropene were elucidated and the rate constants for the major elementary reactions of the intermediate fluorinated peroxy and alkoxy radicals were determined through a best‐fit procedure. Comparison with analogue reactions in non‐fluorinated systems showed a significant increase in reactivity for the self‐reaction and double bond addition by peroxy radicals and β‐scission by alkoxy radicals, which are discussed in terms of fluorine substituent effects.