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Reaction of triethylsilyl radical with sulfides, a laser flash photolysis study
Author(s) -
Soundararajan N.,
Jackson James E.,
Platz Matthew S.
Publication year - 1988
Publication title -
journal of physical organic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.325
H-Index - 66
eISSN - 1099-1395
pISSN - 0894-3230
DOI - 10.1002/poc.610010107
Subject(s) - chemistry , radical , flash photolysis , sulfide , photochemistry , carbon disulfide , photodissociation , sulfur , reaction rate constant , organic chemistry , kinetics , physics , quantum mechanics
Triethylsilyl radical was generated by laser flash photolysis of a 1:1 (v/v) solution of triethylsilane and di‐ tert ‐butyl peroxide. The silicon centered radical was reacted with sulfides to give carbon centered radicals by displacement at sulfur. The carbon radicals were readily detected by their transient absorption spectra. The absolute rate of reaction of triethylsilyl radical with 9‐fluorenylphenylsulfide, di‐ n ‐butylsulfide, di‐ sec ‐butyl sulfide, di‐ tert ‐butyl sulfide and di‐ n ‐butyl disulfide are 2.40 ± 0.12 × 10 8 M −1 S −1 , 1.1 × 10 7 ±0.89×10 6 M −1 S −1 , 8.79± 0.73×10 6 M −1 S −1 , 3.29±0.18×10 6 M −1 S −1 , and 3.41±0.09×10 8 M −1 S −1 , respectively.