Passivating thin bifacial silicon solar cells for industrial production | Zendy

Janßen L. | Zendy; Rinio M. | Zendy; Borchert D. | Zendy; Windgassen H. | Zendy; Bätzner D. L. | Zendy; Kurz H. | Zendy

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Passivating thin bifacial silicon solar cells for industrial production

Author(s) -

Janßen L.,

Rinio M.,

Borchert D.,

Windgassen H.,

Bätzner D. L.,

Kurz H.

Publication year - 2007

Publication title -

progress in photovoltaics: research and applications

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 2.286

H-Index - 131

eISSN - 1099-159X

pISSN - 1062-7995

DOI - 10.1002/pip.750

Subject(s) - passivation , silicon nitride , wafer , materials science , silicon , layer (electronics) , optoelectronics , aluminium , crystalline silicon , nitride , locos , composite material

A scheme for passivating thin multi‐crystalline silicon solar cells compatible to mass production is presented. Wafers with a thickness of 180 µm were processed into solar cells. The otherwise severe bowing has been avoided by reduced aluminium coverage on the rear surface. The process scheme includes a silicon nitride firing through step for conventional screen printed contacts, where a silicon nitride layer on the rear surface acts as surface passivation layer and enables a gain in efficiency of 0.6% [abs.]. Copyright © 2007 John Wiley & Sons, Ltd.

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