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Dry phosphorus silicate glass etching for multicrystalline silicon solar cells
Author(s) -
Nositschka W. A.,
Voigt O.,
Kenanoglu A.,
Borchert D.,
Kurz H.
Publication year - 2003
Publication title -
progress in photovoltaics: research and applications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.286
H-Index - 131
eISSN - 1099-159X
pISSN - 1062-7995
DOI - 10.1002/pip.505
Subject(s) - silicate , etching (microfabrication) , materials science , phosphorus , dry etching , silicon , coating , plasma enhanced chemical vapor deposition , solar cell , metallurgy , silicate glass , chemical engineering , composite material , optoelectronics , layer (electronics) , engineering
A dry plasma etching process for phosphorus silicate glass (PSG) in a SiN‐PECVD batch reactor is developed. In the same reactor PSG etching and anti‐reflective coating (ARC) can be performed successively. To demonstrate industrial feasibility, screen‐printed solar cells are manufactured and compared with cells prepared by a standard wet chemical process. Copyright © 2003 John Wiley & Sons, Ltd.