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Plasma etching: Safety, health and environmental considerations
Author(s) -
Fthenakis V. M.,
Moskowitz P. D.
Publication year - 1995
Publication title -
progress in photovoltaics: research and applications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.286
H-Index - 131
eISSN - 1099-159X
pISSN - 1062-7995
DOI - 10.1002/pip.4670030205
Subject(s) - environmental safety , environmental health , environmental science , environmental planning , business , medicine , human health
Plasma etching in the photovoltaic industries involves several inorganic and organic fluorides, chlorides and bromides, some of which are toxic, corrosive, or flammable. Nitrogen fluoride, a relatively new etching material, presents special concerns because it may form self‐ignitable mixtures with some flammable gases. In addition, non‐toxic compounds (e.g. Freon), can form toxic by‐products in a plasma environment. Another safety concern is failure of vacuum pumps caused by corrosive effluents, and occupational safety issues associated with cleaning traps and reactors. These issues are discussed in this paper and the applicable safety and environmental control options are outlined.