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Moth‐eye antireflection coating fabricated by nanoimprint lithography on 1 eV dilute nitride solar cell
Author(s) -
Tommila Juha,
Aho Arto,
Tukiainen Antti,
Polojärvi Ville,
Salmi Joel,
Niemi Tapio,
Guina Mircea
Publication year - 2013
Publication title -
progress in photovoltaics: research and applications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.286
H-Index - 131
eISSN - 1099-159X
pISSN - 1062-7995
DOI - 10.1002/pip.2191
Subject(s) - nanoimprint lithography , materials science , solar cell , coating , optoelectronics , anti reflective coating , nitride , layer (electronics) , silicon nitride , optics , nanotechnology , fabrication , silicon , medicine , alternative medicine , physics , pathology
We report on the performance of biomimicked antireflection coating applied to dilute nitride solar cell. The coating consists of nanostructures replicating the moth‐eye geometry and has been fabricated by nanoimprint lithography directly within the window layer covering the dilute nitride absorbing junction. The mean reflectivity within the spectral range of 320–1800 nm remains under 5% for incident angles up to 45°. The effect of the coating on the cell performance was assessed by measuring the current–voltage characteristics under simulated solar illumination. A clear performance increase was identified when comparing a solar cell with the moth‐eye coating with a solar cell having a standard SiN x /SiO 2 coating. Copyright © 2012 John Wiley & Sons, Ltd.