z-logo
Premium
19%‐efficient and 43 µm‐thick crystalline Si solar cell from layer transfer using porous silicon
Author(s) -
Petermann Jan Hendrik,
Zielke Dimitri,
Schmidt Jan,
Haase Felix,
Rojas Enrique Garralaga,
Brendel Rolf
Publication year - 2012
Publication title -
progress in photovoltaics: research and applications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.286
H-Index - 131
eISSN - 1099-159X
pISSN - 1062-7995
DOI - 10.1002/pip.1129
Subject(s) - passivation , materials science , wafer , solar cell , optoelectronics , silicon , layer (electronics) , porous silicon , crystalline silicon , short circuit , monocrystalline silicon , open circuit voltage , current density , energy conversion efficiency , nanotechnology , voltage , electrical engineering , engineering , physics , quantum mechanics
We present a both‐sides‐contacted thin‐film crystalline silicon (c‐Si) solar cell with a confirmed AM1.5 efficiency of 19.1% using the porous silicon layer transfer process. The aperture area of the cell is 3.98 cm 2 . This is the highest efficiency ever reported for transferred Si cells. The efficiency improvement over the prior state of the art (16.9%) is achieved by implementing recent developments for Si wafer cells such as surface passivation with aluminum oxide and laser ablation for contacting. The cell has a short‐circuit current density of 37.8 mA cm −2 , an open‐circuit voltage of 650 mV, and a fill factor of 77.6%. Copyright © 2011 John Wiley & Sons, Ltd.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom