Premium
Enhanced thermoelectric performance of poly(3,4‐ethylenedioxythiophene):poly(4‐styrenesulfonate) (PEDOT:PSS) with long‐term humidity stability via sequential treatment with trifluoroacetic acid
Author(s) -
Yemata Temesgen Atnafu,
Kyaw Aung Ko Ko,
Zheng Yun,
Wang Xizu,
Zhu Qiang,
Chin Wee Shong,
Xu Jianwei
Publication year - 2020
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.5921
Subject(s) - pedot:pss , trifluoroacetic acid , seebeck coefficient , thermoelectric effect , materials science , poly(3,4 ethylenedioxythiophene) , electrical resistivity and conductivity , styrene , conductive polymer , thermoelectric materials , chemical engineering , sulfonate , polymer chemistry , thermal conductivity , composite material , polymer , organic chemistry , chemistry , copolymer , electrical engineering , thermodynamics , physics , engineering , sodium , metallurgy
This paper reports a range of effective sequential chemical processes to enhance the thermoelectric performance of conducting poly(3,4‐ethylenedioxythiophene) films doped with poly(styrene sulfonate) anions (PEDOT:PSS). The electrical conductivity of the PEDOT:PSS films was significantly increased from 0.33 to 3748 S cm −1 after a series of sequential treatments with trifluoroacetic acid (TFA) while the Seebeck coefficient and thermal conductivity were slightly reduced from 17.5 ± 1.2 to 16.0 ± 1.1 μV K −1 and 0.537 to 0.415 W m –1 K −1 for the pristine film and treated film, respectively, leading to a significant improvement in power factor up to 97.1 ± 5.4 μW m –1 K −2 . More importantly, around 80% of the electrical conductivity and Seebeck coefficient was retained after 20 days for these TFA‐treated PEDOT:PSS films, revealing the potential for real thermoelectric applications. © 2019 Society of Chemical Industry
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom