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Photochemical reactions of polymers bearing chalcone residues
Author(s) -
Akelah A.,
Selim A.,
Salah EiDeen N.,
Kandil S. H.
Publication year - 1992
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.4990280412
Subject(s) - chalcone , monomer , photosensitizer , polymer , photochemistry , polymerization , chemistry , polymer chemistry , methacrylate , radical polymerization , methyl methacrylate , photopolymer , organic chemistry
Photosensitive polymers based on pendent chalcone moieties were prepared directly by radical polymerization of vinyl‐chalcone monomers. The monomers were synthesized by the esterification reactions of the hydroxyl groups of 4‐ and 4′‐hydroxychalcones with methacryloyl chloride. The monomers (4‐ and 4′‐(methacryloyloxy)chalcones) were polymerized to give the corresponding homo‐and co‐polymers containing different ratios of p ‐nitrophenyl methacrylate as photosensitizer group. Investigation of the photosensitivities of the chalcone polymers was carried out through study of the photochemical reactions on exposure to UV light and measuring the changes in UV spectra before and after irradiation. The results obtained from the disappearance rates of the C=C bonds indicate that the photoreactivities of the polymers are largely affected by the position of the attachment of the chalcone to the polymer backbone and by the concentration of the photosensitizer group.