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Radiation degradation of statistical terpolymers of two aromatic diols with diphenyl sulphone
Author(s) -
Hill David J. T.,
Lewis David A.,
O'donnell James H.,
Pomery Peter J.,
Hedrick James L.,
McGrath James E.
Publication year - 1992
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.4990280309
Subject(s) - bisphenol a , hydroquinone , electron paramagnetic resonance , radical , irradiation , chemistry , nuclear chemistry , polymer chemistry , materials science , organic chemistry , nuclear magnetic resonance , physics , nuclear physics , epoxy
The variation in radiation resistance with composition of statistical terpolymers of (1) bisphenol‐A and biphenol, and (2) hydroquinone and biphenol, with diphenyl sulphone was studied by electron spin resonance spectroscopy after γ irradiation at 77 K and by analysing volatile products after irradiation at 423 K. Approximately linear relationships were obtained between the radiation chemical yields for both radicals, G (R), and sulphur dioxide, G (SO 2 ), and the mole fraction of biphenol units in the terpolymers. Substantially higher radiation resistance was shown by biphenol units compared with either bisphenol‐A or hydroquinone.