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Interaction between Poly(2‐ hydroxyethyl methacrylate) and High Energy Excimer Laser Radiation
Author(s) -
Ver Chris F.,
Klauber Craig,
van Saarloos Paul P.,
Chirila Traian V.
Publication year - 1992
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.4990270308
Subject(s) - fluence , materials science , depolymerization , excimer laser , x ray photoelectron spectroscopy , polymer , irradiation , ablation , methacrylate , laser ablation , excimer , polymerization , analytical chemistry (journal) , radiation , laser , photochemistry , polymer chemistry , composite material , chemical engineering , optics , chemistry , organic chemistry , physics , aerospace engineering , nuclear physics , engineering
Poly(2‐hydroxyethyl methacrylate) was prepared by bulk polymerization and then exposed to ablation by 193‐nm pulsed radiation provided by an ArF excimer laser. The etch curve, i.e. ablation rate versus radiation fluence, presents two changes in the slope, which are consistent with a presumably characteristic behaviour of addition polymers with a strong tendency towards thermal depolymerization. Samples exposed to two fluences, each in the vicinity of one of the inflection points, were analysed by X‐ray photoelectron spectra (XPS) at two different take‐off angles. The results suggest that the ablation mechanism may vary when the fluence changes. At the higher fluence (280mJ/cm 2 ), depolymerization is the dominant process and the material left after etching displays almost no change in the O/C atomic ratio. At the lower fluence (80mJ/cm 2 ), cleavage of the pendant group is dominant and the O/C ratio decreases significantly, especially on the polymer surface.