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Synthesis and photo‐curing behaviors of silicon‐containing (vinyl ether)–(allyl ether) hybrid monomers
Author(s) -
Yuan Fang,
Yingquan Zou
Publication year - 2013
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.4459
Subject(s) - cationic polymerization , vinyl ether , polymerization , polymer chemistry , monomer , materials science , ether , curing (chemistry) , double bond , radical polymerization , polymer , chemistry , organic chemistry , composite material
Five silicon‐containing vinyl ether‐allyl ether hybrid monomers, synthesized with low viscosity, low surface energy, good thermal stability and particularly with remarkable photo polymerization properties, were suitable for nano imprint photoresists.