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Fluorine‐ and siloxane‐containing polymers for supercritical carbon dioxide lithography
Author(s) -
Sha Jing,
Ober Christopher K
Publication year - 2009
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.2533
Subject(s) - supercritical carbon dioxide , siloxane , polymer , supercritical fluid , materials science , solvent , lithography , chemical engineering , fluorine , carbon dioxide , organic chemistry , polymer chemistry , polymer science , nanotechnology , chemistry , composite material , optoelectronics , metallurgy , engineering
Supercritical carbon dioxide has emerged as an environmentally friendly solvent for processing selected polymer and molecular glass photoresists at very high resolution. This article describes recent successes in the lithographic patterning of fluorine‐ and siloxane‐containing polymers using supercritical carbon dioxide as a developer solvent. Copyright © 2009 Society of Chemical Industry