Premium
Optimum reaction conditions for polypyrrole film deposition with some iron(III) compounds
Author(s) -
Ayad Mohamad M.
Publication year - 1994
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.1994.210350103
Subject(s) - polypyrrole , quartz crystal microbalance , pyrrole , molar ratio , deposition (geology) , polymerization , materials science , aqueous solution , quartz , conductive polymer , yield (engineering) , chemical engineering , inorganic chemistry , polymer chemistry , chemistry , polymer , nuclear chemistry , organic chemistry , composite material , catalysis , paleontology , adsorption , sediment , biology , engineering
The optimum reaction conditions for the deposition of smooth conductive polypyrrole (PP) films were monitored using a quartz crystal microbalance technique. This is for oxidative polymerization of pyrrole with some iron(III) compounds. The FeCl 3 · 6H 2 O/pyrrole system in aqueous solution at 20 ± 0.5°C was examined in some detail. The effect of the initial molar ratio of the reactants on the yield and the growth rate of the PP film deposition was studied. The optimum molar ratio was found to be approximately 2.4 ± 0.1. A comparison between the growth rate of the PP films was made when different iron(III) compounds were used. The rate is shown to be affected by the nature of the anions in these compunds.