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Morphology and properties of poly[2‐methoxy‐5‐(2′‐ethyl‐hexyloxy)‐ para ‐phenylene vinylene]/silica nanoparticle hybrid films
Author(s) -
Yu YangYen,
Chen WenChang
Publication year - 2005
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.1731
Subject(s) - materials science , photoluminescence , phenylene , hybrid material , polymer , nanoparticle , luminescence , methacrylate , chemical engineering , scanning electron microscope , morphology (biology) , methyl methacrylate , electroluminescence , polymer chemistry , nanotechnology , optoelectronics , copolymer , composite material , layer (electronics) , biology , engineering , genetics
Poly[2‐methoxy‐5‐(2′‐ethyl‐hexyloxy)‐ para ‐phenylene vinylene] (MEH‐PPV)/silica nanoparticle hybrid films were prepared and characterised. Three kinds of materials were compared: parent MEH‐PPV, MEH‐PPV/silica (hybrid A films), and MEH‐PPV/coupling agent MSMA/silica (hybrid B films), in which MSMA is 3‐(trimethoxysilyl) propyl methacrylate. It was found that the hybrid B films could significantly prevent macrophase separation, as evidenced by scanning electron and fluorescence microscopy. Furthermore, the thermal characteristics of the hybrid films were largely improved in comparison with the parent MEH‐PPV. The UV‐visible absorption spectra suggested that the incorporation of MSMA‐modified silica into MEH‐PPV could confine the polymer chain between nanoparticles and thus increase the conjugation length. The photoluminescence (PL) studies also indicated enhancement of the PL intensity and quantum efficiency by incorporating just 2 wt% of MSMA‐modified silica into MEH‐PPV. However, hybrid A films did not show such enhancement of optoelectronic properties as the hybrid B films. The present study suggests the importance of the interface between the luminescent organic polymers and the inorganic silica on morphology and optoelectronic properties. Copyright © 2004 Society of Chemical Industry