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Micropatterning polyurethane surfaces with lasers
Author(s) -
Martelé Yves,
Naessens Kris,
Van Daele Peter,
Baets Roel,
Callewaert Kristof,
Schacht Etienne
Publication year - 2003
Publication title -
polymer international
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.592
H-Index - 105
eISSN - 1097-0126
pISSN - 0959-8103
DOI - 10.1002/pi.1352
Subject(s) - polymer , excimer laser , micropatterning , polyurethane , excimer , materials science , ablation , laser , laser ablation , absorption (acoustics) , irradiation , attenuation coefficient , photochemistry , polymer chemistry , chemical engineering , composite material , nanotechnology , chemistry , optics , physics , engineering , aerospace engineering , nuclear physics
The ablation properties of a series of segmented polyurethanes were investigated after irradiation with excimer lasers (ArF and KrF). The building blocks of the polymers were varied to make a correlation between the chemical structure and the ablation properties (absorption coefficient and threshold value). The aromatic compounds in the segmented polyurethanes were responsible for the KrF excimer laser ablation sensitivity. Polymers with aromatic diisocyanates had the highest absorption coefficient and lowest threshold value. The polymers with only aliphatic compounds could be classified as low absorbing polymers though, the use of ArF excimer laser with aliphatic polymers led to ablation, with formation of well‐defined cavities. In conclusion, the segmented polyurethanes were more sensitive to ArF excimer laser ablation. Copyright © 2003 Society of Chemical Industry